Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• . Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications. Keywords: atomic layer deposition (ALD); hybrid inorganic–organic thin films; molecular layer deposition (MLD); nanolaminates

• , including pure organic thin films, hybrid inorganic–organic thin films and their mixtures and nanolaminate structures. First we will describe the sequential ALD/MLD process, followed by a few words about the organic precursors used in these processes. Then all the various materials fabricated utilizing MLD

• decline [77]. Different combinations of terephthalaldehyde, 1,4-diaminobenzene and ethanedihydrazide have been used to fabricate quantum dots of varying lengths: These thin films showed promise for sensitization in photovoltaic devices [79][80]. Hybrid inorganic–organic thin films Since the first